1.

Conference Proceedings
Conference Proceedings
1. Sidelobe suppression in a wavelength-tunable optical filter using pair grating structure
Park,C.-Y. ; Kim,J.-S. ; Kang,S.-G. ; Kim,D.-B.
Pub. info.: Terahertz and gigahertz photonics : 19-23 July 1999, Denver, Colorado.  pp.305-312,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3795
2.

Conference Proceedings
Conference Proceedings
2. Optimization of ArF resist for 100-nm node: DOE and fine-tuning of basic platform
Kim,K. ; Wells,G.M. ; Kim,W.D. ; Choi,Y.-J. ; Choi,S.-J. ; Kim,Y.-S. ; Kim,D.-B.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.168-178,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
3.

Conference Proceedings
Conference Proceedings
3. Novel high-performance ArF resist for sub-100-nm lithography
Lee,G. ; Koh,C.-W. ; Jung,J.-C. ; Jung,M.-H. ; Kong,K.-K. ; Kim,J.-S. ; Shin,K.-S. ; Choi,S.-J. ; Kim,Y.-S. ; Choi,Y.-J. ; Kim,D.-B.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.150-158,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
4.

Conference Proceedings
Conference Proceedings
4. Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs
Choi,S.-J. ; Choi,Y.-J. ; Kim,Y.-S. ; Kim,S.-D. ; Kim,D.-B. ; Kim,J.-H. ; Koh,C.-W. ; Lee,G. ; Jung,J.-C. ; Baik,K.-H.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.94-105,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
5.

Conference Proceedings
Conference Proceedings
5. Investigation on dissolution rate effect of newly prepared polystyrene copolymer on the profiles of DUV resists
Kim,H.-J. ; Chung,Y.-S. ; Choi,Y.-J. ; Kim,Y.-S. ; Kim,D.-B.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.528-535,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345