1.

Technical Paper
Technical Paper
1. A Molecular Dynamics Study on Thermophysical Properties and Stability of Nanoscale Liquid Thread.
Kim, B.G. ; Lee, J.S. ; Park, S. ; Choi, Y.K.
Pub. info.: A.S.M.E. paper.  2003.  New York, NY.  American Society of Mechanical Engineers
Title of ser.: ASME Technical Paper : HT
Ser. no.: 2003
2.

Conference Proceedings
Conference Proceedings
2. Inspectability and lithographic effects of reticle defects under the aggressive OPC environment
Kim, B.G. ; Tanaka, K. ; Yoshioka, N. ; Hatta, K. ; Otaki, M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.993-1000,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
3.

Conference Proceedings
Conference Proceedings
3. Required performances of reticle inspection sysytem for ArF lithography through analysis of defect printability study
Kim, B.G. ; Tanaka, K. ; Yoshioka, N. ; Takayama, N. ; Hatta, K. ; Murakami, S. ; Otaki, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.517-525,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
4.

Conference Proceedings
Conference Proceedings
4. DUV inspection capability for 90-nm node mask in ArF lithography
Ohira, K. ; Kim, B.G. ; Tanaka, K. ; Yoshioka, N. ; Tateno, M. ; Takayama, N. ; Murakami, S. ; Hatta, K. ; Akima, S. ; Matsuo, F. ; Otaki, M.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1181-1190,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256