1.

Conference Proceedings
Conference Proceedings
1. Reticle programmed defect size measurement using low-voltage SEM and pattern recognition techniques
Zurbrick,L.S. ; Khanna,S. ; Lee,J. ; Greed,J.J.,Jr. ; Laird,E.R. ; Blanquies,R.M.
Pub. info.: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany.  pp.64-70,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3996
2.

Conference Proceedings
Conference Proceedings
2. Reticle defect size calibration using low-voltage SEM and pattern recognition techniques for sub-200-nm defects
Zurbrick,L.S. ; Khanna,S. ; Lee,J. ; Greed,J.J. ; Laird,E.R. ; Blanquies,R.M.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.651-658,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Multibeam high-resolution UV wavelength reticle inspection
Hung,C.C. ; Yoo,C.S. ; Lin,C.H. ; Volk,W.W. ; Wiley,J.N. ; Khanna,S. ; Biellak,S. ; Wang,D.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.520-531,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
4.

Conference Proceedings
Conference Proceedings
4. Multibeam high-resolution UV wavelength reticle inspection
Hung,C.C. ; Yoo,C.S. ; Lin,C.-H. ; Volk,W.W. ; Wiley,J.N. ; Khanna,S. ; Biellak,S. ; Wang,D.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.165-172,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
5.

Conference Proceedings
Conference Proceedings
5. Detection of 60｡? phase defects on alternating PSMs
Spence,C.A. ; Emery,D. ; Zurbrick,L.S. ; Prakash,D.P. ; Chang,X. ; Khanna,S. ; Leback,B. ; Tsujimoto,E. ; Hughes,G.P. ; Yang,B.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.480-495,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412
6.

Conference Proceedings
Conference Proceedings
6. Detection of submicron phase defects on multiphase random logic reticles
Spence,C.A. ; Nistler,J.L. ; Arnold,W.H. ; Emery,D. ; Zurbrick,L.S. ; Prakash,D.P. ; Chang,X. ; Khanna,S. ; Leback,B. ; Tsujimoto,E. ; Hughes,G.P.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.228-242,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236