1.

Conference Proceedings
Conference Proceedings
1. Improvement of ZEN 4100
Mitao,N. ; Abe,N. ; Kawata,A. ; Tanaka,K. ; Yamamoto,Y. ; Minagawa,T. ; Uraguchi,M. ; Ogawa,M.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.53-60,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. Spray developer for ZEP 7000
Kawata,A. ; Ozawa,K. ; Abe,N. ; Yamashiro,K. ; Aizawa,T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.252-260,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
3.

Conference Proceedings
Conference Proceedings
3. New concept for negative-tone electron-beam resist
Wada,Y. ; Kashiwagi,M. ; Tanaka,H. ; Kawata,A. ; Tanaka,K. ; Yamamoto,Y.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.70-77,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793