1.

Conference Proceedings
Conference Proceedings
1. SOI FORMATION BY A LINE-SOURCE ELECTRON BEAM AND ELECTRICAL CHARACTERISTICS
Hada, H. ; Okabayashi, H. ; Saito, S. ; Nakamura, T. ; Kawase, Y.
Pub. info.: Silicon-on-insulator and buried metals in semiconductors : symposium held November 30-December 3, 1987, Boston, Massachusetts, U.S.A..  pp.201-206,  1988.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 107
2.

Conference Proceedings
Conference Proceedings
2. Application of Ultra-rapid Thermal Annealing for Electrical Activation for Next Generation MOSFETs
Suguro, K. ; Ito, T. ; Nishinohara, K. ; Matsuo, K. ; Iinuma, T. ; Itokawa, H. ; Kawase, Y.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.39-49,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01
3.

Conference Proceedings
Conference Proceedings
3. Unified mask data formats for EB writers
Kuriyama, K. ; Suzuki, T. ; Hirumi, J. ; Yoshioka, N. ; Hojo, Y. ; Kawase, Y. ; Hara, S. ; Hoga, M. ; Watanabe, S.W. ; Inoue, M. ; Kawase, H. ; Kamimoto, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.660-671,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. Development of an e-beam lithography system for 100- to 90-nm node reticles
Komagata, T. ; Kawase, Y. ; Nakagawa, Y. ; Gotoh, N. ; Tanaka, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.328-338,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
5.

Conference Proceedings
Conference Proceedings
5. Enhancement of unified mask data formats for EB writers
Suzuki, T. ; Hirumi, J. ; Yoshioka, N. ; Hojyo, Y. ; Kawase, Y. ; Sakamoto, S. ; Kuriyama, K. ; Narukawa, S. ; Houga, M.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1186-1194,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
6.

Conference Proceedings
Conference Proceedings
6. Development of new stream format with GDSII upper compatibility and high compression rate
Kuriyama, K. ; Hirumi, J. ; Yoshioka, N. ; Hojo, Y. ; Kawase, Y. ; Hara, S. ; Hoga, M. ; Watanabe, S.W. ; Inoue, M. ; Kawase, H. ; Kamimoto, T.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.83-93,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
7.

Conference Proceedings
Conference Proceedings
7. Improvement of unified mask data formats for EB writers
Suzuki, T. ; Hirumi, J. ; Yoshioka, N. ; Hojyo, Y. ; Kawase, Y. ; Hara, S. ; Kuriyama, K. ; Hoga, M. ; Watanabe, S.W. ; Kawase, H. ; Kamimoto, T. ; Kato, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.414-421,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
8.

Conference Proceedings
Conference Proceedings
8. The unified mask data format based on OASIS for VSB EB writers [5853-101]
Suzuki, T. ; Hirumi, J. ; Hojyo, Y. ; Kawase, Y. ; Sakamoto, S. ; Kuriyama, K. ; Narukawa, S. ; Hoga, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.152-159,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853