1.

Conference Proceedings
Conference Proceedings
1. HF CONCENTRATION OF CONTROL IN IC MANUFACTURING
Kashkoush, Ismail ; Chen, G. ; Boelen, P. ; Geomini, M.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.252-257,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
2.

Conference Proceedings
Conference Proceedings
2. THE USE OF OZONATED HF SOLUTIONS FOR POLYSILICON STRIPPING
Chen, Gim S. ; Kashkoush, Ismail ; Novak, Richard E.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.296-302,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
3.

Conference Proceedings
Conference Proceedings
3. Particulate Removal From Silicon Substrates in Megasonic-Assisted Dilute SC1 Chemistry
Kashkoush, Ismail ; Brause, Eric ; Grant, Robert ; Novak, Rich
Pub. info.: Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A..  pp.21-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 477
4.

Conference Proceedings
Conference Proceedings
4. In Situ Chemical Concentration Control for Wafer Wet Cleaning
Kashkoush, Ismail ; Brause, Eric ; Novak, Richard ; Grant, Robert
Pub. info.: Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A..  pp.311-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 477