1.

Conference Proceedings
Conference Proceedings
1. Yield-limiting NMOSFET gate depletion in a deep submicrometer CMOS process
Karnett,M.P. ; Qian,S. ; Mitchell,T. ; Subramaniam,V. ; Sur,H. ; Haby,B.J. ; Brugge,H.B.
Pub. info.: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.191-199,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4181
2.

Conference Proceedings
Conference Proceedings
2. Optimization of pre-gate clean technology for a 0.35-ｦﾌm dual-oxide/dual-voltage CMOS process
Brugge,H.B. ; Karnett,M.P. ; de Muizon,E. ; Zhou,J. ; Page,A. ; Vines,L.B. ; Haby,B.J.
Pub. info.: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.52-60,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3212
3.

Conference Proceedings
Conference Proceedings
3. Plasma-induced oxide contamination in a 0.35-ｦﾌm CMOS process
Karnett,M.P. ; Zhou,J. ; Ghosh,S. ; Echtle,D. ; Fritz,L. ; Manley,M. ; Scott,G.
Pub. info.: Microelectronic Manufacturing Yield, Reliability, and Failure Analysis II.  pp.327-331,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2874
4.

Conference Proceedings
Conference Proceedings
4. Influence of metal deposition temperature on deep-submicrometer metal lithography
Subramaniam,V. ; Siems,D.D. ; Karnett,M.P. ; Maheshwary,S.R. ; Sur,H.
Pub. info.: In-Line Methods and Monitors for Process and Yield Improvement.  pp.298-305,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3884