1.

Conference Proceedings
Conference Proceedings
1. Controlling CD variations in a massively parallel pattern generator
Luberek, J.Z. ; Carroll, A.M. ; Sandstroem, T. ; Karawajczyk, A.
Pub. info.: Optical Microlithography XV.  Part One  pp.671-678,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Conference Proceedings
Conference Proceedings
2. Laser PG performance for 100-nm photomasks
Rosling, M. ; Karawajczyk, A. ; Askebjer, P. ; Zerne, R. ; Carroll, A.M. ; Eklund, R. ; Fosshaug, H. ; Sandstrom, T.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.759-766,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
3.

Conference Proceedings
Conference Proceedings
3. Improved photomask accuracy with a high-productivity DUV laser pattern generator [6349-34]
ostrom, T. ; Mahlen, J. ; Karawajczyk, A. ; Rosling, M. ; Carlqvist, P. ; Askebjer, P. ; Karlin, T. ; Sallander, J. ; osterberg, A.
Pub. info.: Photomask Technology 2006.  pp.63490Y-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
4.

Conference Proceedings
Conference Proceedings
4. Pattern accuracy and throughput optimization for an SLM-based 248-nm DUV laser mask pattern generator
Sjoberg, H. ; Chauvet, J.-M. ; Harkesjo, J. ; Hogfeldt, P. ; Karawajczyk, A. ; Karlsson, J. ; Kjellberg, L. ; Mahlen, J. ; Beyerl, A. ; Vedenpaa, J. ; Goodoree, R. ; Bjuggren, M. ; Aman, J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.632-642,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
5.

Conference Proceedings
Conference Proceedings
5. Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes
Aman, J. ; Fosshaug, H.A. ; Hedqvist, T. ; Harkesjo, J. ; Hogfeldt, P. ; Jacobsson, M. ; Karawajczyk, A. ; Karlsson, J. ; Rosling, M. ; Sjoberg, H.J.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.684-694,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256