1.

Conference Proceedings
Conference Proceedings
1. THE EFFECT OF POLYSILICON DOPING (USING ION IMPLANTATION OR PBr3 DIFFUSION OR INSITU DOPING) ON TiSi2 FORMATION
Chittipeddi, S. ; Dziuba, C. M ; Kelly, M. J., ; Kannan, V. C. ; Irwin, R. B. ; Kahora, P. M. ; Cochoran, W. T.
Pub. info.: Advanced metallization and processing for semiconductor devices and circuits--II : symposium held April 27-May 1, 1992, San Francisco, California, U.S.A..  pp.207-212,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 260
2.

Conference Proceedings
Conference Proceedings
2. HIGH QUALITY Si AND Si1-XGeX FILMS AND HETEROJUNCTION BIPOL;AR TRANSISTORS GROWN BY RAPID THERMAL CHEMICAL VAPOR DEPOSITION (RTCVD)
Green, M. L. ; Brasen, D. ; Temkin, H. ; Kannan, V. C. ; Luftman, H. S.
Pub. info.: Rapid thermal annealing/chemical vapor deposition and integrated processing : sympoisium held April 25-28, 1989, San Diego, California, U.S.A..  pp.55-64,  1989.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 146
3.

Conference Proceedings
Conference Proceedings
3. COMPARATIVE STUDIES OF GATE OXIDES USING THERMAL, STACKED GATE, AND RAPID THERMAL OXIDATION
Chittipeddi, S. ; Roy, P. K. ; Kannan, V. C. ; Singh, R. ; Dziuba, C. M.
Pub. info.: Polysilicon thin films and interfaces.  pp.327-332,  1990.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 182
4.

Conference Proceedings
Conference Proceedings
4. IMPACT OF VARIOUS POLYSILICON DEPOSITION PROCESS ON THIN GATE-OXIDE PROPERTIES IN SUBMICRON CMOS TECHNOLOGY
Rot, P. K. ; Kook, T. ; Kannan, V. C. ; Felton, G. J. ; Powell, R. A. ; Velaga, A. N.
Pub. info.: Polysilicon thin films and interfaces.  pp.281-286,  1990.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 182