1.

Conference Proceedings
Conference Proceedings
1. Application of PGSD (proximity gap suction development) to 70 nm NAND mask fabrication
Sakurai, H. ; Shibata, T. ; Itoh, M. ; Ooishi, K. ; Funakoshi, H. ; Okamoto, Y. ; Oono, S. ; Kaneda, M. ; Kamei, S. ; Hayashi, N.
Pub. info.: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.29-36,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5835
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of a new-generation photomask develop system for CAR
Cantrell, R. ; Tschinkl, M. ; Feicke, A. ; Porsche, W. ; Lee, G. ; Kotoda, T. ; Tichy, P. ; Fukai, T. ; Kamei, S. ; Asai, H.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.190-200,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
3.

Conference Proceedings
Conference Proceedings
3. Application of diluted developer solution (DDS) process to 193-nm photolithography process
Tanaka, K. ; Iwaki, H. ; Yamada, Y. ; Kiba, Y. ; Kamei, S. ; Goto, K.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.557-570,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
4.

Conference Proceedings
Conference Proceedings
4. Visualization study of the stream line and secondary flow in the running-water bathtub
Kamei, S. ; Isshiki, S. ; Takahashi, A.
Pub. info.: 25th International Congress on High-Speed Photography and Photonics.  pp.823-830,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4948
5.

Conference Proceedings
Conference Proceedings
5. First photomask developer based on state-of-the-art wafer processing technology
Tichy, P. ; Fukai, T. ; Kamei, S. ; Asai, H. ; Kotoda, T. ; Takeshita, K. ; Miyamoto, T. ; Okamoto, Y. ; Funakoshi, H. ; Koga, S. ; Oono, S. ; Cantrell, R. ; Feicke, A. ; Porsche, W. ; Tschinkl, M. ; Lee, G.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1216-1227,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
6.

Conference Proceedings
Conference Proceedings
6. More evolved PGSD (proximity gap suction developer) for controlling movement of dissolution products [6349-175]
Sakurai, H. ; Oppata, Y. ; Murano, K. ; Sakai, M. ; Itoh, M. ; Watanabe, H. ; Funakoshi, H. ; Ooishi, K. ; Okamoto, Y. ; Kaneda, M. ; Kamei, S. ; Hayashi, N.
Pub. info.: Photomask Technology 2006.  pp.63494J-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349