Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes. pp.223-230, 1997. Pennington, NJ. Electrochemical Society
Ohmi, T. ; Sekine, K. ; Kaihara, R. ; Saito, Y. ; Shirai, Y. ; Hirayama, M.
Pub. info.:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.3-, 1999. Warrendale, PA. MRS - Materials Research Society