1.

Conference Proceedings
Conference Proceedings
1. Effective alignment techniques and their implementation to enhance total overlay accuracy on highly reflective films
Y.-H. Min ; S.-C. Moon ; H.-S. Kim ; K.-H. Baik ; S.-H. Choi
Pub. info.: Integrated circuit metrology, inspection, and process control IX : 20-22 February 1995, Santa Clara, California.  pp.287-297,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2439
2.

Conference Proceedings
Conference Proceedings
2. Study of optical proximity effects using off-axis illumination with attenuated phase shift mask
C.-N. Ahn ; K.-H. Baik ; Y.-S. Lee ; H.-E. Kim ; I.-B. Hur
Pub. info.: Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California.  pp.222-239,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2440
3.

Conference Proceedings
Conference Proceedings
3. CD bias control with in-situ plasma treatment in EPSM photomask etch
K. Yung ; C. J. Choi ; K.-H. Baik
Pub. info.: Photomask technology 2007.  1  pp.67300A-1-67300A-7,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730