1.

Conference Proceedings
Conference Proceedings
1. Study of iso-dense bias (IDB) sensitivity to laser spectral shape at the 45nm node
K. Yoshimochi ; T. Uchiyama ; T. Tamura ; T. Theeuwes ; R. Peeters ; H. van der Laan ; H. Bakker ; K. Morisaki ; T. Oga
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Benefit of ArF immersion lithography in 55 nm logic device manufacturing
T. Uchiyama ; T. Tamura ; K. Yoshimochi ; P. Graupner ; H. Bakker ; E. van Setten ; K. Morisaki
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
3.

Conference Proceedings
Conference Proceedings
3. 45nm node logic device OPE matching between exposure tools through laser bandwidth tuning
K. Yoshimochi ; T. Tamura ; S. Nagahara ; T. Uchiyama ; N. Farrar
Pub. info.: Optical Microlithography XXI.  2  pp.69242K-1-69242K-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924