1.

Conference Proceedings
Conference Proceedings
1. The Ground Calibration of the Back-Side Illuminated CCD camera of X-ray Imaging Spectrometer (XIS) onboard Astro-E2 (Suzaku)
H. Yamaguchi ; H. Nakajima ; K. Koyama ; T.G. Tsuru ; H. Matsumoto ; H. Tsunemi ; K. Hayashida ; K. Torii ; M. Namiki ; S. Katsuda ; D. Matuura ; T. Miyauchi
Pub. info.: Proceedings of the X-ray universe 2005, 26-30 September 2005, El Escorial, Madrid, Spain.  pp.949-954,  2006.  Noordwijk, Netherlands.  ESA Publications Division
Title of ser.: ESA SP
Ser. no.: 604
2.

Conference Proceedings
Conference Proceedings
2. Asymmetric Distribution of Charge Trap in HfO₂-Based High-k Gate Dielectrics
K. Higuchi ; T. Naito ; A. Uedono ; K. Shiraishi ; K. Torii ; M. Boero ; T. Chikyow ; S. Yamosaki ; K. Yamada ; R. Hasumuma ; K. Yamabe
Pub. info.: Physics and technology of high-k gate dielectrics III.  pp.777-788,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(5)
3.

Conference Proceedings
Conference Proceedings
3. HfSiON Gate Dielectrics for hp45 Node and Beyond
Y. Nara ; S. Inumiya ; K. Torii ; K. Nakamura
Pub. info.: Physics and technology of high-k gate dielectrics III.  pp.645-652,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(5)
4.

Conference Proceedings
Conference Proceedings
4. Characterization of Charge Trapping and Dielectric Breakdown of HfAlOx/SiON Dielectric Gate Stack
Y. Pei ; S. Nagamachi ; H. Murakami ; S. Higashi ; S. Miyazaki ; T. Kawahara ; K. Torii ; Y. Nara
Pub. info.: Physics and Chemistry of SiO2 and the Si-SiO2 Interface-5.  pp.163-172,  2005.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(1)
5.

Conference Proceedings
Conference Proceedings
5. Theoretical Studies on the Physical Properties of Poly-Si and Metal Gates/HfO₂ Related High-k Dielectrics Interfaces
K. Shiraishi ; K. Torii ; Y. Akasaka ; T. Nakayama ; T. Nakaoka ; S. Miyazaki ; T. Chikyow ; K. Yamada ; Y. Nara
Pub. info.: Physics and technology of high-k gate dielectrics III.  pp.479-494,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(5)
6.

Conference Proceedings
Conference Proceedings
6. Physics of Metal/High-k Interfaces
T. Nakayama ; K. Shiraishi ; S. Miyazaki ; Y. Akasaka ; T. Nakaoka ; K. Torii ; A. Ohta ; P. Ahmet ; K. Ohmori ; N. Umezawa ; H. Watanabe ; T. Chikyow ; Y. Nara ; H. Iwal ; K. Yamada
Pub. info.: Physics and technology of high-k gate dielectrics 4.  pp.129-142,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(3)
7.

Conference Proceedings
Conference Proceedings
7. New Theory of Effective Workfunctions at Metal/High-k Dielectric Interfaces - Application to Metal/High-k HfO₂ and La₂O₃ Dielectric Interfaces
K. Shiraishi ; T. Nakayatna ; Y. Akasaka ; S. Miyazaki ; T. Nakaoka ; K. Ohmori ; P. Abmet ; K. Torii ; H. Watanabe ; T. Chikyow ; Y. Nara ; H. Iwai ; K .Yamada
Pub. info.: Dielectrics for nanosystems II: materials science, processing, reliability, and manufacturing.  pp.25-40,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 2(1)
8.

Technical Paper
Technical Paper
8. Research on the Effect of Lubricant Oil and Fuel Properties on LSPI Occurrence in Boosted S. I. Engines
M. Kassai ; K. Torii ; T. Shiraishi ; T. Noda ; T.K. Goh
Pub. info.: SAE 2016 International Powertrains, Fuels & Lubricants Meeting : technical paper.  2016.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2016