1.

Conference Proceedings
Conference Proceedings
1. Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2
S. Mimotogi ; F. Uesawa ; M. Tominaga ; H. Fujise ; K. Sho ; M. Katsumata ; H. Hane ; A. Ikegami ; S. Nagahara ; T. Ema ; M. Asano ; H. Kanai ; T. Kimura ; M. Iwai
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Sub-45nm resist process using stacked-mask process
Y. Seino ; K. Kobayashi ; K. Sho ; H. Kato ; S. Miyoshi
Pub. info.: Advances in resist materials and processing technology XXV.  2  pp.69232O-1-69232O-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923
3.

Conference Proceedings
Conference Proceedings
3. Immersion resist process for 32-nm node logic devices
T. Ema ; K. Sho ; H. Yonemitsu ; Y. Seino ; H. Fujise
Pub. info.: Advances in resist materials and processing technology XXV.  1  pp.69230E-1-69230E-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923