1.

Conference Proceedings
Conference Proceedings
1. Control of Crystalline Microstructures in Metal Gate Electrodes for Nano CMOS Devices
K. Ohmori ; T. Chikyow ; T. Hosoi ; H. Watanabe ; K. Nakajima
Pub. info.: Dielectrics for nanosystems 3: materials science, processing, reliability, and manufacturing.  pp.201-207,  2008.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 13(2)
2.

Conference Proceedings
Conference Proceedings
2. Relation between Solubility of Silicon in High-k Oxides and the Effect of Fermi Level Pinning
N. Umezawa ; K. Shiraishi ; K. Kakushima ; H. Iwai ; K. Ohmori
Pub. info.: Dielectrics for nanosystems 3: materials science, processing, reliability, and manufacturing.  pp.15-20,  2008.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 13(2)
3.

Conference Proceedings
Conference Proceedings
3. Wide Controllability of Flatband Voltage in La₂O₃ Gate Stack Structures-Remarkable Advantages of La₂O₃ over HfO₂
K. Ohmori ; P. Ahmet ; K. Shiraishi ; K. Yamabe ; H. Watanabe ; Y. Akasaka ; N. Umezawa ; K. Nakajima ; M. Yoshitake ; T. Nakayama ; K. Chang ; K. Kakushima ; Y. Nara ; M. L. Green ; H. Iwai ; K. Yamada ; T. Cchikyow
Pub. info.: Physics and technology of high-k gate dielectrics 4.  pp.351-362,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(3)
4.

Conference Proceedings
Conference Proceedings
4. Physics of Metal/High-k Interfaces
T. Nakayama ; K. Shiraishi ; S. Miyazaki ; Y. Akasaka ; T. Nakaoka ; K. Torii ; A. Ohta ; P. Ahmet ; K. Ohmori ; N. Umezawa ; H. Watanabe ; T. Chikyow ; Y. Nara ; H. Iwal ; K. Yamada
Pub. info.: Physics and technology of high-k gate dielectrics 4.  pp.129-142,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(3)
5.

Conference Proceedings
Conference Proceedings
5. New Theory of Effective Workfunctions at Metal/High-k Dielectric Interfaces - Application to Metal/High-k HfO₂ and La₂O₃ Dielectric Interfaces
K. Shiraishi ; T. Nakayatna ; Y. Akasaka ; S. Miyazaki ; T. Nakaoka ; K. Ohmori ; P. Abmet ; K. Torii ; H. Watanabe ; T. Chikyow ; Y. Nara ; H. Iwai ; K .Yamada
Pub. info.: Dielectrics for nanosystems II: materials science, processing, reliability, and manufacturing.  pp.25-40,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 2(1)
6.

Conference Proceedings
Conference Proceedings
6. Theoretical Studies on Metal/High-k Gate Stacks
K. Shiraishi ; Y. Akasaka ; G. Nakamura ; T. Nakayama ; S. Miyazaki ; H. Watanabe ; A. Ohta ; K. Ohmori ; T. Chikyow ; Y. Nara ; K. Yamabe ; K. Yamada
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment.  pp.191-204,  2007.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 6(1)
7.

Conference Proceedings
Conference Proceedings
7. Combinatorial Fabrication and Characterization of Oxide and Metal Thin Film Composition Spreads
P. Ahmet ; T. Nagata ; D. Kukuruznyak ; K. Ohmori ; K. Kakushima ; K. Tsutsui ; T. Chikyow ; H. Iwai
Pub. info.: Dielectrics for nanosystems II: materials science, processing, reliability, and manufacturing.  pp.79-90,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 2(1)
8.

Conference Proceedings
Conference Proceedings
8. Progress of hard mask material for multi-layer stack application
H. Harada ; K. Yonemura ; T. Tanaka ; D. Kawana ; N. Yamashita ; K. Ohmori
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
9.

Conference Proceedings
Conference Proceedings
9. Single component chemically-amplified resist based on dehalogenation of polymer
H. Yamamoto ; T. Kozawa ; S. Tagawa ; K. Ohmori ; M. Sato ; H. Komano
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
10.

Conference Proceedings
Conference Proceedings
10. Chemically amplified molecular resist based on fullerene derivative for nanolithography
H. Yamamoto ; T. Kozawa ; S. Tagawa ; T. Ando ; K. Ohmori
Pub. info.: Advances in resist materials and processing technology XXV.  1  pp.69230N-1-69230N-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923