1.

Conference Proceedings
Conference Proceedings
1. Automatic calibration of lithography simulation parameters
Jug,S. ; Huang,R. ; Byers,J.D. ; Mack,C.A.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.380-395,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
2.

Conference Proceedings
Conference Proceedings
2. Metrology and analysis of two-dimensional SEM patterns
Mack,C.A. ; Jug,S. ; Jones,R. ; Apte,P. ; Williams,S. ; Pochkowski,M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.377-384,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344