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11 results

Conference Proceedings

1. Ultralow-energy imaging for metrology

Joy,D.C.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.42-50, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

2. Computer modeling of charging-induced electron beam deflection in electron beam lithography

Hwu,J.J. ; Ko,Y.-U. ; Joy,D.C.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.239-246, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

3. Some issues in SEM-based metrology (Invited Paper)

Joy,D.C.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.102-109, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

4. Metrics of resolution and performance for CD-SEMs

Joy,D.C. ; Ko,Y.-U. ; Hwu,J.J.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.108-114, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

5. In-line holography using a point source

Frost,B.G. ; Joy,D.C.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part2 pp.794-801, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

Conference Proceedings

6. Time-resolved diagnostics and mechanisms of single-wall carbon nanotube synthesis by the laser vaporization technique

Ceohegan,D.B. ; Puretzky,A.A. ; Fan,X. ; Pennycook,S.J. ; Cuillorn,M.A. ; Simpson,M.L. ; Merkulov,V.I. ; Austin,D.W. ; Joy,D.C.

Pub. info.:	Laser-induced damage in optical materials, 2000 : 32nd Annual Boulder Damage Symposium, proceedings, 16-18, October, 2000, Boulder, Colorado. pp.1-12, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4347

Conference Proceedings

7. 1999 ITRS metrology roadmap and its implications for lithography

Diebold,A.C. ; Joy,D.C.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.2-10, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

8. Separation and characterization of single-chain polymer particles

Festag,R. ; Wunderlich,B. ; Joy,D.C. ; Alexandratos,S.D. ; Cook,K.D.

Pub. info.:	Space processing of materials : 4-5 August 1996, Denver, Colorado. pp.155-165, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2809

Conference Proceedings

9. Monte Cario model of charging in resists in e-beam lithography

Ko,Y.-Y. ; Joy,D.C.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XV. pp.544-551, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4344

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Conference Proceedings

10. Secondary-electron image profiles using bias voltage technique in deep contact hole

Ko,Y.-U. ; Joy,D.C. ; Sullivan,N.T. ; Mastovich,M.E.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XV. pp.37-45, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4344

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Author: Joy,D.C.