1.

Conference Proceedings
Conference Proceedings
1. Novel approach for high resolution using cycloolefin-alt-maleic acid derivatives polymer for ArF lithography
Lee, J.-B. ; Park, J.-H. ; Seo, D.-C. ; Kim, C.-M. ; Lim, Y.-T. ; Cho, S.-D. ; Joo, H.-S. ; Jeon, H.-P. ; Kim, S.-J.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.623-630,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology
Joo, H.-S. ; Seo, D.C. ; Kim, C.M. ; Lim, Y.T. ; Cho, S.D. ; Lee, J.B. ; Jeon, H.P. ; Park, J.H. ; Jung, J.C. ; Shin, K.S. ; Bok, C.K. ; Moon, S.-C.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.725-732,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039