1.

Conference Proceedings
Conference Proceedings
1. Trends and Process Considerations for Making New Generations of Magnetic Recording Heads (A Single Turn Perpendicular Alternative)
Johns, E. ; Batra, S. ; Covington, MO ; Crue, B. ; Eckert, A. ; Van der Hezyden, P. ; Jayashankar, J. ; Mountfleld, K. ; Tran, U. ; Yang, X-M ; Rottmayer, R.
Pub. info.: Magnetic materials, processes, and devices VII and electrodeposition of alloys : proceedings of the International Symposium.  pp.54-76,  2002.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-27
2.

Conference Proceedings
Conference Proceedings
2. Electron-beam lithography method for sub-50-nm isolated trench with high aspect ratio
Yang, X.M. ; Eckert, A.R. ; Mountfield, K. ; Gentile, H. ; Seiler, C. ; Brankovic, S. ; Harris, R. ; Johns, E.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.168-177,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
3.

Conference Proceedings
Conference Proceedings
3. Three-dimensional imaging of isolated lines of negative e-beam resist
Eckert, A.R. ; Gentile, H. ; Mountfield, K. ; Seiler, C. ; Yang, X. ; Johns, E.
Pub. info.: Emerging Lithographic Technologies VII.  2  pp.1074-1083,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
4.

Conference Proceedings
Conference Proceedings
4. Electron-beam lithography of isolated trenches with chemically amplified positive resist
Eckert, A.R. ; Bojko, R.J. ; Gentile, H. ; Harris, R. ; Jayashankar, J. ; Johns, E. ; Minor, K. ; Mountfield, K. ; Seiler, C. ; Yang, X.M.
Pub. info.: Emerging Lithographic Technologies VI.  Part Two  pp.878-887,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688