1.

Conference Proceedings
Conference Proceedings
1. The analysis of the criteria of phase error by evaluating the influence of lens aberration on the lithographic performance
Jeong, C.-Y. ; Ahn, J.-K. ; Park, K.-Y. ; Choi, J. S. ; Lee, J. G.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1681-1692,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Impact of mask defect in a high MEEF process
Jeong, C.-Y. ; Park, K.-Y. ; Choi, J.S. ; Lee, J.G. ; Lee, D.-H.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1067-1078,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. The study of contact hole MEEF and defect printability
Jeong, C.-Y. ; Lim, Y.H. ; Kim, H.I. ; Park, J.L. ; Choi, J.S. ; Lee, J.G.
Pub. info.: Optical Microlithography XVII.  pp.930-938,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
4.

Conference Proceedings
Conference Proceedings
4. The evaluation of assist feature defect printability for sub-0.13-μm technology
Jeong, C.-Y. ; Kim, Y.K. ; Park, K.-Y. ; Choi, J.S. ; Lee, J.G.
Pub. info.: Optical Microlithography XVII.  pp.1255-1266,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
5.

Conference Proceedings
Conference Proceedings
5. CD-SEM calibration with TEM to reduce CD measurement error
Jeong, C.-Y. ; Lee, J. ; Park, K.-Y. ; Lee, W.G. ; Lee, D.-H.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.747-755,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689