1.

Conference Proceedings
Conference Proceedings
1. Optical thin-film decomposition for DUV positive-tone resist process monitoring
Niu,X. ; Jakatdar,N.H. ; Spanos,C.J. ; Bendik,J.J. ; Kovacs,R.P.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.411-418,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. Characterization of a positive chemically amplified photoresist for process control
Jakatdar,N.H. ; Niu,X. ; Spanos,C.J. ; Romano,A.R. ; Bendik,J.J. ; Kovacs,R.P. ; Hill,S.L.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.586-593,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
3.

Conference Proceedings
Conference Proceedings
3. Characterization of a chemically amplified photoresist for simulation using a modified"poor man's DRM" methodology
Jakatdar,N.H. ; Niu,X. ; Spanos,C.J.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.578-585,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
4.

Conference Proceedings
Conference Proceedings
4. Deep-ultraviolet lithography simulator tuning by resist profile matching
Niu,X. ; Jakatdar,N.H. ; Spanos,C.J.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.245-252,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
5.

Conference Proceedings
Conference Proceedings
5. Specular spectral profilometry on metal layers
Bao,J. ; Niu,X. ; Jakatdar,N.H. ; Spanos,C.J. ; Bendik,J.J.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.882-892,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
6.

Conference Proceedings
Conference Proceedings
6. Specular spectroscopic profilometry for the sub-0.18ｦﾌm polySi-gate processes
Niu,X. ; Jakatdar,N.H. ; Yedur,S.K. ; Singh,B.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.846-855,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
7.

Conference Proceedings
Conference Proceedings
7. Physically based model for predicting volume shrinkage in chemically amplified resists
Jakatdar,N.H. ; Bao,J. ; Spanos,C.J. ; Subramanian,R. ; Rangarajan,B. ; Romano,A.R.
Pub. info.: In-line characterization, yield reliability, and failure analysis in microelectronics manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.16-24,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3743
8.

Conference Proceedings
Conference Proceedings
8. In-situ metrology for deep-ultraviolet lithography process control
Jakatdar,N.H. ; Niu,X. ; Musacchio,J.T. ; Spanos,C.J.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.262-270,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
9.

Conference Proceedings
Conference Proceedings
9. Phase profilometry for the 193-nm lithography gate stack
Jakatdar,N.H. ; Niu,X. ; Bao,J. ; Spanos,C.J. ; Yedur,S.K. ; Deleporte,A.G.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.116-124,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998