1.

Conference Proceedings
Conference Proceedings
1. Model based short range mask process correction
G. Chen ; J. -S. Wang ; S. Bai ; R. Howell ; J. Wiley
Pub. info.: Photomask and next-generation lithography mask technology XV.  1  pp.70280G-1-70280G-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028
2.

Conference Proceedings
Conference Proceedings
2. Model-based mask verification on critical 45nm logic masks
F. Sundermann ; F. Foussadier ; T. Takigawa ; J. Wiley ; A. Vacca
Pub. info.: Photomask and next-generation lithography mask technology XV.  1  pp.70280U-1-70280U-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028
3.

Conference Proceedings
Conference Proceedings
3. Model-based mask verification
F. Foussadier ; F. Sundermann ; A. Vacca ; J. Wiley ; G. Chen
Pub. info.: Photomask technology 2007.  3  pp.673051-1-673051-8,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730