1.

Conference Proceedings
Conference Proceedings
1. SELECTIVE REMOVAL OF Ni FOR SALICIDATION AND FULLY SILICIDED GATES
K. Kraus ; V. Fano Leston ; J. Snow ; K. Xu ; M. de Potter de ten Broeck ; A. Lauwers ; P. W. Mertens ; F. Kovacs
Pub. info.: Cleaning Technology in Semiconductor Device Manufacturing IX.  pp.67-74,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(3)
2.

Conference Proceedings
Conference Proceedings
2. SELECTIVE ETCHING OF SiGe FOR REMOVAL OF DUMMY LAYERS IN FULLY SILICIDED GATE ARCHITECTURES
J. Snow ; R. Vos ; K. G. Anil ; H. Kraus ; K. Xu ; F. Grinninger ; G. Wagner ; F. Kovacs ; P. W. Mertens
Pub. info.: Cleaning Technology in Semiconductor Device Manufacturing IX.  pp.207-213,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(3)
3.

Conference Proceedings
Conference Proceedings
3. SINGLE - WAFER WET CLEANING FOR A HIGH PARTICLE REMOVAL EFFICIENCY ON HYDROPHOBIC SURFACE
K. Sano ; A. Izumi ; A. Eitoku ; J. Snow ; E. Kesters ; P. Mertens
Pub. info.: Cleaning Technology in Semiconductor Device Manufacturing IX.  pp.134-141,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(3)