1.

Conference Proceedings
Conference Proceedings
1. High Mobility Channels for Ultimate CMOS
D. Sadana ; S. Koester ; Y. Sun ; E. W. Kiewra ; S. W. Bedell ; A. Reznicek ; J. Ott ; K. Fogel ; D. J. Webb ; J. Fompeyrine ; J. Locquet ; M. Sousa ; R. Germann
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment.  pp.343-354,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(2)
2.

Conference Proceedings
Conference Proceedings
2. Current Challenges in Ge MOS Technology
A. Dimoulas ; M. Houssa ; A. Ritenour ; J. Fompeyrine ; W. Tsai ; J. Seo ; Y. Panayiotatos ; P. Tsipas ; D. P. Brunco ; M. R. Caymax ; J. Locquet ; C. Dieker
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment.  pp.371-384,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(2)