1.

Conference Proceedings
Conference Proceedings
1. Advances in ALD Equipment for sub-40nm Memory Capacitor Dielectrics: Precursor delivery, Materials and Processes
Z. Karim ; Y. Senzaki ; S. Ramanathan ; J. Lindner ; H. Silva
Pub. info.: Atomic layer deposition applications 4.  pp.125-134,  2007.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 16(4)
2.

Conference Proceedings
Conference Proceedings
2. Advanced Metal Gate Electrode Options Compatible with ALD and AVD HfSiO x-Based Gate Dielectrics
Z. Karim ; O. Biossiere ; C. Lohe ; Z. Zhang ; C. Manke ; P. Lehnen ; P. K. Baumann ; J. Dalton ; W. Park ; S. Ramanathan ; J. Lindner ; F. Seidel and
Pub. info.: Physics and technology of high-k gate dielectrics 4.  pp.363-374,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(3)