1.

Conference Proceedings
Conference Proceedings
1. SEM metrology for advanced lithographies
B. Bunday ; J. Allgair ; B. J. Rice ; J. Byers ; Y. Avitan ; R. Peltinov ; M. Bar-zvi ; O. Adan ; J. Swyers ; R. Z. Shneck
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
2.

Conference Proceedings
Conference Proceedings
2. High-index immersion lithography: preventing lens photocontamination and identifying optical behavior of LuAG
V. Liberman ; M. Rothschild ; S. T. Palmacci ; R. Bristol ; J. Byers
Pub. info.: Optical Microlithography XXI.  1  pp.692416-1-692416-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
3.

Conference Proceedings
Conference Proceedings
3. Continuing 193nm optical lithography for 32nm imaging and beyond
E. C. Piscani ; D. Ashworth ; J. Byers ; C. Van Peski ; P. Zimmerman
Pub. info.: Optical Microlithography XXI.  2  pp.69242I-1-69242I-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
4.

Conference Proceedings
Conference Proceedings
4. An analysis of double exposure lithography options
S. Lee ; J. Byers ; K. Jen ; P. Zimmerman ; B. Rice
Pub. info.: Optical Microlithography XXI.  2  pp.69242A-1-69242A-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
5.

Conference Proceedings
Conference Proceedings
5. Development and evaluation of 193nm immersion generation-three fluid candidates
P. A. Zimmerman ; J. Byers ; B. Rice ; C. K. Ober ; E. P. Giannelis
Pub. info.: Advances in resist materials and processing technology XXV.  1  pp.69230A-1-69230A-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923
6.

Conference Proceedings
Conference Proceedings
6. Development of an operational high refractive index resist for 193nm immersion lithography
P. A. Zimmerman ; J. Byers ; E. Piscani ; B. Rice ; C. K. Ober
Pub. info.: Advances in resist materials and processing technology XXV.  1  pp.692306-1-692306-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923