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10 results

Conference Proceedings

1. A novel strategy of lithography-error-budget optimization for the 65-nm node: mask specifications for hyper-NA imaging [5992-35]

Iwase, K. ; Ishikawa, K. ; Takeuchi, K. ; Ozawa, K. ; Uesawa, F.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59920Y-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

2. State-of-the-art performance of stencil mask for LEEPL

Nohama, S. ; Omori, S. ; Iwase, K. ; Watanabe, Y. ; Amai, K. ; Sasaki, T. ; Moriya, S. ; Kitagawa, T.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.970-978, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

3. On-site use of 1x stencil mask: control over image placement and dimension

Omori, S. ; Iwase, K. ; Watanabe, Y. ; Amai, K. ; Sasaki, T. ; Nohama, S. ; Ashida, I. ; Moriya, S. ; Kitagawa, T.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.958-969, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

4. Analysis of critical dimension uniformity for LEEPL

Yoshizawa, M. ; Iwase, K. ; Ohtorii, H. ; Oguni, K. ; Hane, H. ; Amai, K. ; Moriya, S. ; Nakano, H. ; Kitagawa, T.

Pub. info.:	Emerging Lithographic Technologies VIII. pp.1052-1059, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5374

Conference Proceedings

5. Litho-and-mask concurrent approach to the critical issues for proximity electron lithography

Omori, S. ; Iwase, K. ; Amai, K. ; Watanabe, Y. ; Nohama, S. ; Nohdo, S. ; Moriya, S. ; Kitagawa, T. ; Yotsui, K. ; Suzuki, G. ; Tamura, A.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.132-142, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

6. First via-hole TEG fabricated by using 90-nm CMOS technology and proximity electron lithography: electric and lithographic results

Kitagawa, T. ; Yoshizawa, M. ; Iwase, K. ; Omori, S. ; Nohama, S. ; Nakano, H. ; Moriya, S. ; Kawahira, H.

Pub. info.:	Emerging Lithographic Technologies VIII. pp.537-545, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5374

Conference Proceedings

7. A novel approach to the mask inspection for proximity electron lithography based on electron beam imaging

Iwase, K. ; Omori, S. ; Nohama, S. ; Yotsui, K. ; Suzuki, G. ; Sasaki, Y. ; Itoh, K. ; Tamura, A. ; Maruyama, S. ; Moriya, S. ; Kitagawa, T.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.915-922, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

Conference Proceedings

8. Mask specifications for 45-nm node: the impact of immersion lithography and polarized light imaging [6283-78]

Iwase, K. ; Ozawa, K. ; Uesawa, F.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.628337-628338, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

Conference Proceedings

9. A new criterion of mask birefringence for polarized illumination [6349-194]

Iwase, K. ; Thunnakart, B. ; Kaneguchi, T. ; Ozawa, K. ; Yokoyama, T. ; Morikawa, Y. ; Uesawa, F.

Pub. info.:	Photomask Technology 2006. pp.634951-634951, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

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Conference Proceedings

10. New mask format low-energy electron-beam proximity projection lithography

Koike, K. ; Omori, S. ; Iwase, K. ; Ashida, I. ; Moriya, S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.837-846, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

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Author: Iwase, K.