1.

Conference Proceedings
Conference Proceedings
1. Advanced mask technology for 230-mm reticle fabrication
Hiruta,K. ; Kubo,S. ; Iwamatsu,T. ; Fujisawa,T. ; Sugiyama,M. ; Morimoto,H.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.853-857,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of an advanced mask-writing system:II
Kvbo,S. ; Hiruta,K. ; Sugiyama,M. ; Iwamatsu,T. ; Fujisawa,T. ; Morimoto,H.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.532-541,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Evaluation of loading effect of NLD dry etching: ？
Fujisawa,T. ; Iwamatsu,T. ; Hiruta,K. ; Morimoto,H. ; Harashima,N. ; Sasaki,T. ; Hara,M. ; Yamashiro,K. ; Ohkubo,Y. ; Takehana,Y.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.549-552,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
4.

Conference Proceedings
Conference Proceedings
4. Evaluation of phase and transmittance error on deep-UV halftone phase-shift mask
Kyoh,S. ; Sakurai,H. ; Iwamatsu,T. ; Yamada,A. ; Higashikawa,I.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.127-133,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793
5.

Conference Proceedings
Conference Proceedings
5. Proximity effect correction for reticle fabrication
Sugiyama,M. ; Kubo,S. ; Hiruta,K. ; Iwamatsu,T. ; Fujisawa,T. ; Morimoto,H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.180-187,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
6.

Conference Proceedings
Conference Proceedings
6. Evaluation of loading effect of NLD dry etching
Iwamatsu,T. ; Fujisawa,T. ; Hiruta,K. ; Morimoto,H. ; Harashima,N. ; sasaki,T. ; Hara,M. ; Yamashiro,K. ; Ohkubo,Y. ; Takehana,Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.235-242,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
7.

Conference Proceedings
Conference Proceedings
7. CD guarantee for the next-generation photomasks with CD-SEM
Iwamatsu,T. ; Hiruta,K. ; Morimoto,H. ; Ataka,M. ; Nitta,J.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.505-512,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
8.

Conference Proceedings
Conference Proceedings
8. Deep-UV attenuated phase-shift mask for quarter-micrometer photolithography
Kyoh,S. ; Sakurai,H. ; Iwamatsu,T. ; Higashikawa,I. ; Taniguchi,R. ; Watanabe,H. ; Tuchiya,T.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.300-309,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621