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18 results

Conference Proceedings

1. Mask enhancer technology for 45-nm node contact hole fabrication

Yuito, T. ; Wiaux, V. ; Look, L. Van ; Vandenberghe, G. ; Irie, S. ; Matsuo, T. ; Misaka, A. ; Watanabe, H. ; Sasago, M.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1377-1387, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

2. Feasibility study of SCAAM-type Alt-PSM for 157-nm lithography

Morikawa, Y. ; Kokubo, H. ; Noguchi, K. ; Sasaki, S. ; Mohri, H. ; Hoga, M. ; Kanda, N. ; Irie, S. ; Watanabe, K. ; Suganaga, T. ; Itani, T.

Pub. info.:	Optical Microlithography XVI. Part Two pp.1137-1145, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

3. 157-nm lithography for 65-nm node SRAM-gate

Suganaga, T. ; Irie, S. ; Miyoshi, S. ; Kim, J.-H. ; Watanabe, K. ; Kurose, E. ; Furukawa, T. ; Hagiwara, T. ; Ishimaru, T. ; Itani, T.

Pub. info.:	Optical Microlithography XVI. Part One pp.261-269, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

4. Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography

Irie, S. ; Kanda, N. ; Watanabe, K. ; Suganaga, T. ; Itani, T.

Pub. info.:	Optical Microlithography XV. Part Two pp.1654-1664, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

5. Feasibility study of TaSiOx-type Att-PSM for 157-nm lithography

Watanabe, K. ; Yamabe, O. ; Kanda, N. ; Kim, J. ; Uchida, N. ; Irie, S. ; Suganaga, T. ; Itani, T.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.444-451, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

6. Pattern transfer processes for 157-nm lithography

Miyoshi, S. ; Furukawa, T. ; Watanabe, H. ; Irie, S. ; Itani, T.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.221-232, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

7. Fluoropolymers for 157-nm single-layer resists developed using a new etching rate estimation model (KI-Model)

Kawaguchi, Y. ; Sasaki, T. ; Irisawa, J. ; Yokokoji, O. ; Irie, S. ; Otoguro, A. ; Itani, T. ; Fujii, K.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.525-532, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

8. Evaluation systems of F2 laser lithography materials

Itakura, Y. ; Kawasa, Y. ; Egawa, K. ; Sumitani, A. ; Sasaki, H. ; Higasikawa, I. ; Irie, S. ; Fujii, K. ; Itani, T. ; Nakano, H. ; Hata, H.

Pub. info.:	Optical Microlithography XVII. pp.1606-1615, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

Conference Proceedings

9. Evaluation of outgassing from a fluorinated resist for 157-nm lithography

Irie, S. ; Fujii, K. ; Itakura, Y. ; Kawasa, Y. ; Egawa, K. ; Uchino, I. ; Sumitani, A. ; Itani, T.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.226-237, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

10.

Conference Proceedings

10. 157-nm resist assessment by a full-field scanner

Otoguro, A. ; Irie, S. ; Ishimaru, T. ; Suganaga, T. ; Itani, T. ; Fujii, K.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.245-253, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

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Author: Irie, S.