1.

Conference Proceedings
Conference Proceedings
1. THE INFLUENCE OF HBr DISCHARGE AMBIENCE ON POLY-Si/ SiO2 ETCHING SELECTIVITY
Ikawa, E. ; Tokashiki, K. ; Kikkawa, T. ; Teraoka, Y. ; Nishiyama, I.
Pub. info.: Low energy ion beam and plasma modification of materials : symposium held April 30-May 2, 1991, Anaheim, California, U.S.A..  pp.255-262,  1991.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 223
2.

Conference Proceedings
Conference Proceedings
2. Analysis of Fluorocarbon Film Deposited by C4F8/CO Gas Plasma
Akimoto, T. ; Furuouya, S. ; Harashima, K. ; Ikawa, E.
Pub. info.: Proceedings of the tenth symposium on plasma processing.  pp.311-319,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-20
3.

Conference Proceedings
Conference Proceedings
3. Analysis of Sidewall Protecting Film after Anisotropic Aluminum Etching Using a SiO2 Mask
Kawamoto, H. ; Miyamoto, H. ; Ikawa, E.
Pub. info.: Proceedings of the tenth symposium on plasma processing.  pp.398-403,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-20
4.

Conference Proceedings
Conference Proceedings
4. CONTROL OF NATiVE OXIDES ON DEEP-SUBMICRON CONTACT-HOLE-BOTTOM SURFACES
Aoto, N. ; Nakamori, M. ; Hada, H. ; Kunio, T. ; Teraoka, Y. ; Nishiyama, I. ; Ikawa, E.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.65-69,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7