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Proceedings of the Fourth International Symposium on Semiconductor Wafer Bonding : science, technology, and applications. pp.481-492, 1997. Pennington, NJ. Electrochemical Society
Iida, M. ; Er, H. ; Hisamatsu, N. ; Asaoka, N. ; Imae, T.
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Proceedings of the International Conference on Colloid and Surface Science, Tokyo, Japan, November 5-8, 2000 : 25th Anniversary of the Division of Colloid and Surface Chemistry, the Chemical Society of Japan. pp.31-34, 2001. Amsterdam. Elsevier
Shimoyama, K. ; Kanda, T. ; Iida, M. ; Maeda, T. ; Yamabe, K.
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Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.459-, 1999. Warrendale, PA. MRS - Materials Research Society
Show, Y. ; Matsuoka, F. ; Ri, S. ; Akiba, Y. ; Kurosu, T. ; Iida, M. ; Izumi, T.
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Defects in electronic materials II : symposium held December 2-6, 1996, Boston, Massachusetts, U.S.A.. pp.681-, 1997. Pittsburgh, Penn. MRS - Materials Research Society