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Conference Proceedings

1. Study of optical proximity effects using off-axis illumination with attenuated phase shift mask

C.-N. Ahn ; K.-H. Baik ; Y.-S. Lee ; H.-E. Kim ; I.-B. Hur

Pub. info.:	Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California. pp.222-239, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2440

Conference Proceedings

2. Effect of pattern density for contact windows in an attenuated phase shift mask

I.-B. Hur ; J.-H. Kim ; I.-H. Lee ; H.-E. Kim ; C.-N. Ahn

Pub. info.:	Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California. pp.278-289, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2440

Conference Proceedings

3. Effects of photo resist erosion in development on critical dimension performance for 45nm node and below

G.-H. Hwang ; D.-H. Kim ; C. Yu ; B.-S. Kang ; I.-B. Hur

Pub. info.:	Photomask technology 2008. 2 pp.71223A-1-71223A-10, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7122

Conference Proceedings

4. Haze generation effect by pellicle and packing box on photomask

J.-M. Kim ; M. Patil ; W.-G. Jeong ; I.-B. Hur ; C. Shin

Pub. info.:	Photomask technology 2007. 3 pp.67304O-1-67304O-12, 2007. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6730