1.

Conference Proceedings
Conference Proceedings
1. Multibeam high-resolution UV wavelength reticle inspection
Hung,C.C. ; Yoo,C.S. ; Lin,C.H. ; Volk,W.W. ; Wiley,J.N. ; Khanna,S. ; Biellak,S. ; Wang,D.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.520-531,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
2.

Conference Proceedings
Conference Proceedings
2. Characterization of environmental halogen molecule contamination-induced pad surface corrosion
Chu,P.-T. ; Cho,C.W. ; Hsiao,H.C. ; Wu,J.S. ; Hung,C.C. ; Chao,Y.C
Pub. info.: Microelectronic Manufacturing Yield, Reliability, and Failure Analysis III.  pp.19-26,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3216
3.

Conference Proceedings
Conference Proceedings
3. Positive-tone wafer coating materials evaluation on lithography process
Huang,D.F. ; Chiou,J.Y. ; Hung,C.C. ; Young,B.R.
Pub. info.: Integrated Optics Devices V.  pp.375-380,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4277
4.

Conference Proceedings
Conference Proceedings
4. Multibeam high-resolution UV wavelength reticle inspection
Hung,C.C. ; Yoo,C.S. ; Lin,C.-H. ; Volk,W.W. ; Wiley,J.N. ; Khanna,S. ; Biellak,S. ; Wang,D.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.165-172,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
5.

Conference Proceedings
Conference Proceedings
5. Effect of registration and proximity effect in split-gate flash device
Chiou,J.Y. ; Huang,D.F. ; Liu,C.L. ; Hung,C.C.
Pub. info.: Process Control and Diagnostics.  pp.342-347,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4182
6.

Conference Proceedings
Conference Proceedings
6. New optical metrology for masks: range and accuracy rivals SEM
Cottle,R. ; Fiekowsky,P. ; Hung,C.C. ; Lin,S.C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.612-617,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409