1.

Conference Proceedings
Conference Proceedings
1. Compensation of resist trim process and polygate plasma microloading effect for lithography process window and CD uniformity improvement
Lee, K.M. ; Fan, C.W. ; Hwang, J.R. ; Liu, C.C. ; Hung, K.C.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.1007-1016,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
2.

Conference Proceedings
Conference Proceedings
2. Challenges of 50-nm gate process in alternating phase shifting lithography
Fang, C.Y. ; Hung, K.C. ; Huang, Z.X. ; Lin, B.S. ; Hsu, S.H. ; Yen, Y.S. ; Yen, P.W. ; Huang, J. ; Liu, H.Y.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.391-402,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
3.

Conference Proceedings
Conference Proceedings
3. Specification of the phase angle of a 6% attenuated PSM mask used in ArF lithography
Chang, C.H. ; Schacht, J. ; Lin, B.S.-M ; Hung, K.C. ; Huang, I.H.
Pub. info.: Optical Microlithography XVII.  pp.902-910,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377