1.

Conference Proceedings
Conference Proceedings
1. Using a charge-coupled device (CCD) to simultaneously gather x-ray fluorescence (XRF) and x-ray diffraction (XRD) information
Cornaby,S. ; Grow,T.D. ; Reyes-Mena,A. ; Moody,P.W. ; Stradling,A. ; Hughes,T. ; Knight,L.V.
Pub. info.: X-ray, and gamma-ray instrumentation for astronomy XII : 31 July and 2 August 2001 San Diego, USA.  pp.166-172,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4497
2.

Conference Proceedings
Conference Proceedings
2. Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes)
Varanasi,P.R. ; Jordhamo,G.M. ; Lawson,M.C. ; Chen,K.-J. ; Brunsvold,W.R. ; Hughes,T. ; Keller,R. ; Khojasteh,M. ; Li,W. ; Allen,R.D. ; Ito,H. ; Opitz,J. ; Truong,H.D. ; Wallow,T.I.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1157-1162,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
3.

Conference Proceedings
Conference Proceedings
3. Direct write exposure and ablation of photoresist in fine scale interconnect circuits
Beck,W.A. ; Strole,J. ; Yarno,J. ; Hughes,T. ; Ross,B.
Pub. info.: Saratov Fall Meeting 2000 : Laser Physics and Photonics; and Spectroscopy and Molecular Modeling, 3-7 October 2000, Saratov, Russia.  pp.1-8,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4243
4.

Conference Proceedings
Conference Proceedings
4. ArF resist for contact hole application
Chen,K.-J.R. ; Lawaon,M.C. ; Hughes,T. ; Brunsvld,W.R. ; Varanasi,P.R. ; Keller,R. ; Jordhamo,G.M.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.791-797,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
5.

Conference Proceedings
Conference Proceedings
5. Postmodification as a way to improve the lithographic performance of resist materials
Li,W. ; Varanasi,P.R. ; Lawson,M.C. ; Hughes,T. ; Jordhamo,G.M. ; Allen,R.D. ; Ito,H.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.784-790,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
6.

Conference Proceedings
Conference Proceedings
6. "IBM 193-nm bilayer resist: materials, lithographic performance, and optimization"
Kwong,R.W. ; Varanasi,P.R. ; Lawson,M.C. ; Hughes,T. ; Jordhamo,G.M. ; Khojasteh,M. ; Mahorowala,A.P. ; Sooriyakumaran,R. ; Brock,P.J. ; Larson,C.E. ; Fenzel-Alexander,D. ; Truong,H.D. ; Allen,R.D.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.50-57,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345