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Conference Proceedings

1. Competitive assessment of 200-mm epitaxial silicon wafer flatness

Huff,H.R. ; McCormack,D.W.,Jr.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.625-630, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

2. Prospective technology for system-on-a-chip: N2 implant followed by VHP O2 reoxidation

Luo,T.Y. ; Al-Shareef,H.N. ; Brown,G.A. ; Watt,V.H.C. ; Karamcheti,A. ; Jackson,M.D. ; Huff,H.R. ; Evans,B. ; Lee,C.H. ; Luan,H.F. ; Kwong,D.L.

Pub. info.:	Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA. pp.271-280, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4181

Conference Proceedings

3. Correlation between the reliability of ultrathin ISSG SiO2 and hydrogen content

Luo,T.Y. ; Al-Shareef,H.N. ; Brown,G.A. ; Laughery,M. ; Watt,V.H.C. ; Karamcheti,A. ; Jackson,M.D. ; Huff,H.R.

Pub. info.:	Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA. pp.220-231, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4181

Conference Proceedings

4. Wafer flatness modeling for scanning steppers

Goodall,R.K. ; Huff,H.R.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography X. pp.76-84, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2725