1.

Conference Proceedings
Conference Proceedings
1. CD variation in 30-kV EBL due to resist heating:experiment and simulation
Babin,S.V. ; Hudek,P. ; Kostic,I. ; Kuzmin,I.Yu.
Pub. info.: Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California.  pp.368-373,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3048
2.

Conference Proceedings
Conference Proceedings
2. Fabrication of piezoresistive-sensed AFM cantilever probe with integrated tip
Rangelow,I.W. ; Shi,F. ; Hudek,P. ; Gotszalk,T. ; Grabiec,P.B. ; Dumania,P.
Pub. info.: Micromachining and microfabrication process technology II : 14-15 October, 1996, Austin, Texas.  pp.56-64,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2879
3.

Conference Proceedings
Conference Proceedings
3. Comparative study of resist heating and proximity effect influence on CD variation in 30-kV EBL
Babin,S.V. ; Hudek,P. ; Kostic,I. ; Kuzmin,I.Yu.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.655-661,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
4.

Conference Proceedings
Conference Proceedings
4. Chemically amplified deep-UV resists for micromachining
Hudek,P. ; Rangelow,I.W. ; Kostic,I. ; Grabiec,P.B. ; Shi,F.
Pub. info.: Micromachining and microfabrication process technology II : 14-15 October, 1996, Austin, Texas.  pp.182-193,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2879
5.

Conference Proceedings
Conference Proceedings
5. Tool and process optimization for 100-nm maskmsking using a 50-Vk variale shaped e-beam system
Beyer,D. ; Loffelmacher,D. ; Goedl,G. ; Hudek,P. ; Schnabel,B. ; Elster,T.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.88-98,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562