1.

Conference Proceedings
Conference Proceedings
1. Low-fidelity space-based imagery for automatic feature extraction using a multisensor fusion approach under IMaG
Hsu,S. ; Huang,J.C.
Pub. info.: Image and signal processing for remote sensing IV : 21-23 September 1998, Barcelona, Spain.  pp.407-417,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3500
2.

Conference Proceedings
Conference Proceedings
2. Dual damascene photo process using negative-tone resist
Shi,X. ; Fung,A.C. ; Hsu,S. ; Li,Z. ; Nguyen,T. ; Socha,R.J. ; Conley,W.E. ; Dusa,M.V.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.835-842,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
3.

Conference Proceedings
Conference Proceedings
3. Concealed fixed object detection with hyperspectral data in SRE's IMaG environment
Hsu,S. ; Huang,J.C.
Pub. info.: Imaging spectrometry III : 28-30 July 1997, San Diego, California.  pp.69-80,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3118
4.

Conference Proceedings
Conference Proceedings
4. Stochastic algorithm for evaluation of energy function of Hopfield neural networks
Sen,E. ; Pandya,A.S. ; Hsu,S.
Pub. info.: Applications and science of artificial neural networks III : 21-24 April, 1997, Orlando, Florida.  pp.430-437,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3077
5.

Conference Proceedings
Conference Proceedings
5. Trench warfare!: fitting photons for fine-feature fabrication
Kuijten,J.P. ; Conley,W. ; Socha,R.J. ; Goor,S.van de ; Hsu,S. ; Smith,D. ; Oliveras,M. ; Strozenski,K.
Pub. info.: Optical Microlithography XIV.  4346  pp.1058-1065,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
6.

Conference Proceedings
Conference Proceedings
6. RuMBa: a rule-model OPC for low MEEF 130-nm KrF lithography
Hsu,S. ; Shi,X. ; Hsu,M. ; Corcoran,N.P. ; Chen,J.F. ; Desai,S. ; Sherrill,M.J. ; Tseng,Y.C. ; Chang,H.A. ; Kao,J.F. ; Tseng,A. ; Liu,W.J. ; Chen,A. ; Lin,A. ; Kujten,J.P. ; Jacobs,E. ; Verhappen,A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.172-185,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
7.

Conference Proceedings
Conference Proceedings
7. Impact of attenuated PSM repair for 130-nm polygate lithography process
Shi,X. ; Hsu,S. ; Socha,R.J. ; Chen,J.F. ; Cheng,A. ; Su,C. ; Cheng,J. ; Chen,A. ; Lin,H. ; Wang,D. ; Chen,D. ; Lin,A. ; Conley,W. ; Metzger,D. ; Shi,X. ; Imamura,P.H. ; Sherrill,M.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.707-715,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
8.

Conference Proceedings
Conference Proceedings
8. Understanding the forbidden pitch and assist feature placement
Shi,X. ; Hsu,S. ; Chen,F. ; Hsu,M. ; Socha,R.J. ; Dusa,M.V.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.968-979,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
9.

Conference Proceedings
Conference Proceedings
9. Lihtography process optimization for 130-nm polygate mask and the impact of mask error factor
Hsu,S. ; Shi,X. ; Socha,R.J. ; Chen,J.F. ; Yee,J.C. ; Anath,M. ; Desai,S. ; Imamura,P.H. ; Sherrill,M.J. ; Tseng,Y.C. ; Chang,H.A. ; Kao,J.F. ; Tseng,A. ; Liu,W.J. ; Hsu,S. ; Lin,A. ; Kujten,J.P. ; Jacobs,E. ; Verhappen,A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.783-796,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344