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16 results

Technical Paper

1. A Study of Injector Deposits, Combustion Chamber Deposits (CCD) and Intake Valve Deposits (IVD) in Direct Injection Spark Ignition (DISI) Engines.

Noma, K. ; Noda, T. ; Ashida, T. ; Kamioka, R. ; Hosono, K.

Pub. info.:	2002 Powertrain and Fluid Systems Conference and Exhibition : SAE technical paper. 2002. Warrendale, Penn.. Society of Automotive Engineers
Title of ser.:	Society of Automotive Engineers technical paper series
Ser. no.:	2002

Conference Proceedings

2. R-mask: a new concept and its application for small-volume production

Hayano, K. ; Hotta, S. ; Hasegawa, N. ; Hosono, K. ; Tanaka, T. ; Suko, K. ; Sasaki, S. ; Mohri, H. ; Hoga, M. ; Hayashi, N.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.257-268, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

Conference Proceedings

3. A novel Alt-PSM structure: isnt this an embedded Atten-PSM? [6349-100]

Nakao, S. ; Hosono, K. ; Maejima, S. ; Narimatsu, K. ; Hanawa, T. ; Suko, K.

Pub. info.:	Photomask Technology 2006. pp.63492Q-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

4. Requirements for mask technology from the view point of SOC and FLASH memory trends (Invited Paper) [5853-01]

Imai, A. ; Yoshioka, N. ; Hanawa, T. ; Narimatsu, ’K. ; Hosono, K. ; Suko, K.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.1-9, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

5. Photomask quality assessment strategy at 90-nm technology node with aerial image simulation

Nagamura, Y. ; Hosono, K. ; Pang, L. ; Chan, K.K. ; Tanaka, Y.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.476-483, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

6. New repair of clear defects on half-tone PSM using Ga implantation

Nagamura, Y. ; Kanai, I. ; Tange, K. ; Hosono, K. ; Hayashi, K. ; Ikeda, H. ; Nagashige, S. ; Ishijima, M. ; Iwasaki, H. ; Kikuchi, Y.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.466-475, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

7. Defect printability and inspection capability for tri-tone PSM

Nagamura, Y. ; Maetoko, K. ; Maeshima, K. ; Tamada, N. ; Hosono, K. ; Fujimoto, M. ; Kodera, Y. ; Goto, K. ; Narita, T. ; Matsuo, F. ; Akima, S. ; Ishijima, M. ; Iwasaki, H. ; Kikuchi, Y.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.454-465, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

8. Improvement of critical dimension stability of chemically amplified resist by overcoat II

Kumada, T. ; Tange, K. ; Maetoko, K. ; Hosono, K. ; Tsuzuki, M. ; Yonetani, K. ; Terada, R. ; Nakashiba, Y. ; Anzai, S. ; Kikuchi, Y.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.101-106, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

9. Preliminary study of 65-nm-node alternating phase-shift mask fabrication

Hosono, K. ; Ishikawa, N. ; Asai, S. ; Maruyama, H. ; Miyahara, Y. ; Sasaki, S. ; Yamashita, Y. ; Hotta, Y. ; Furukawa, T. ; Naito, M. ; Miyashita, H. ; Noguchi, S.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1273-1280, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

10.

Conference Proceedings

10. Improvement of critical dimension stability of chemical amplified resist by overcoat

Kumada, T. ; Sasahara, A. ; Maetoko, K. ; Hosono, K. ; Honma, T ; Kodaira, Y. ; Nakashiba, Y. ; Tsuzuki, M. ; Kikuchi, Y.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.188-195, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

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Author: Hosono, K.