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14 results

Conference Proceedings

1. Damage control during dry etching of EUV mask:I. Control of surface roughness

Hoshino,E. ; Ogawa,T. ; Takahashi,M. ; Hoko,H. ; Yamanashi,H. ; Hirano,N. ; Okazaki,S.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.786-791, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

2. Removal process for buffer layer on multilayer of EUVL mask

Hoshino,E. ; Ogawa,T. ; Takahashi,M. ; Hoko,H. ; Yamanashi,H. ; Hirano,N. ; Chiba,A. ; Lee,B.-T. ; Ito,M. ; Okazaki,S.

Pub. info.:	17th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.13-17, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4349

Conference Proceedings

3. Application of charge-dispersing layer to reticle fabrication

Shirabe,K. ; Hoshino,E. ; Watanabe,K.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.37-41, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

4. Dry etching with consideration to thicker reticle size

Hoshino,E. ; Hasegawa,H. ; Shishido,K. ; Yoshioka,N. ; Aoyama,S. ; Hayashi,A. ; Sasaki,T. ; Iso,H. ; Tokoro,Y.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.206-211, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

5. Tantalum nitride films for the absorber material of refractive-type EUVL mask

Takahashi,M. ; Ogawa,T. ; Hoshino,E. ; Hoko,H. ; Lee,B.T. ; Chiba,A. ; Yamanashi,H. ; Okazaki,S.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.760-770, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

6. Characteristics of the Ru buffer layer for EUVL mask patterning

Lee,B.T. ; Hoshino,E. ; Takahashi,M. ; Yoneda,T. ; Yamanashi,H. ; Hoko,H. ; Chiba,A. ; Ito,M. ; Ryoo,M.H. ; Ogawa,T. ; Okazaki,S.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.746-753, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

7. Smooth low-stress sputtered tantalum and tantalum alloy films for the absorber material of reflective-type EUVL

Takahashi,M. ; Ogawa,T. ; Hoko,H. ; Hoshino,E. ; Yamanashi,H. ; Hirano,N. ; Chiba,A. ; Okazaki,S.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.484-495, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

8. Deflection error due to charge-up effect of reticle substrate

Hirumi,J. ; Hayashimoto,T. ; Kawabata,T. ; Hosono,K. ; Hoshino,E. ; Kai,J.

Pub. info.:	Photomask and X-Ray Mask Technology V. pp.307-318, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3412

Conference Proceedings

9. Process scheme for removing buffer layer on multilayer for EUVI mask

Hoshino,E. ; Ogawa,T. ; Takahashi,M. ; Hoko,H. ; Yamanashi,H. ; Hirano,N. ; Chiba,A. ; Ito,M. ; Okazaki,S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.124-130, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

10.

Conference Proceedings

10. Surface preparation of EUVL mask substrate for multilayer coating by supersonic hydrocleaning technique

Hirano,N. ; Hoko,H. ; Hoshino,E. ; Ogawa,T. ; Chiba,A. ; Yamanashi,H. ; Takahashi,M. ; Okazaki,S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.430-437, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

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Author: Hoshino,E.