1.

Conference Proceedings
Conference Proceedings
1. Lithographic performance of an environmentally stable chemically amplified photoresist(ESCAP)
Conley,W.E. ; Breyta,G. ; Brunsvold,W.R. ; DiPietro,R.A. ; Hofer,D.C. ; Holmes,S.J. ; Ito,H. ; Nunes,R. ; Fichtl,G. ; Hagerty,P. ; Thackeray,J.W.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.34-60,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
2.

Conference Proceedings
Conference Proceedings
2. Characterization of linewidth variation on 248- and 193-nm exposure tools
Gabor,A.H. ; Brunner,T.A. ; Chen,J. ; Chen,N. ; Deshpande,S. ; Ferguson,R.A. ; Horak,D.V. ; Holmes,S.J. ; Liebmann,L.W. ; Mansfield,S.M. ; Molless,A.F. ; Progler,C.J. ; Rabidoux,P.A. ; Ryan,D. ; Talvi,P. ; Tsou,L. ; Vampatella,B.R. ; Wong,A.K. ; Yang,Q. ; Yu,C.
Pub. info.: Optical Microlithography XIV.  4346  pp.259-264,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
3.

Conference Proceedings
Conference Proceedings
3. 193 lithography and RELACS processing for BEOL lithography
DellaGuardia,R. ; Petrillo,K.E. ; Chen,J. ; Rabidoux,P. ; Dalton,T.J. ; Holmes,S.J. ; Hadel,L.M. ; Malone,K. ; Mahorowala,A.P. ; Greco,S. ; Ferguson,R.A.
Pub. info.: Optical Microlithography XIV.  4346  pp.1029-1040,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346