1.

Conference Proceedings
Conference Proceedings
1. Lithographic and chemical contrast of single-component top-surface imaging (TSI) resists
Bohland,J.R. ; Chambers,J. ; Das,S. ; Fedynyshyn,T.H. ; Holl,S.M. ; Hutchinson,J.M. ; Rao,V. ; Sinta,R.F.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 2  pp.1009-1016,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Progress in 193-nm top-surface imaging process development
Hutchinson,J.M. ; Rao,V. ; Zhang,G. ; Pawloski,A.R. ; Fonseca,C.A. ; Chambers,J. ; Holl,S.M. ; Das,S. ; Henderson,C.C. ; Wheeler,D.R.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.165-175,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
3.

Conference Proceedings
Conference Proceedings
3. New materials for 157-nm photoresists characterization and properties
Crawford,M.K. ; Feiring,A.E. ; Feldman,J. ; French,R.H. ; Periyasamy,M.P. ; III,F.L.Schadt ; Smalley,R.J. ; Zurnsteg,F.C. ; Kunz,R.R. ; Rao,V. ; Liao,L. ; Holl,S.M.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.357-364,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
4.

Conference Proceedings
Conference Proceedings
4. Progress in 157-nm lithography development at Intel:resists and reticles
Rao,V. ; Panning,E.M. ; Liao,L. ; Hutchinson,J.M. ; Grenville,A. ; Holl,S.M. ; Bruner,D. ; Balasubramanian,R. ; Kuse,R. ; Dao,G.T. ; Zheng,J.-F. ; Orvek,K.J. ; Langston,J.C. ; Lo,F.-C.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1574-1581,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000