1.

Conference Proceedings
Conference Proceedings
1. Second level exposure for advanced phase shift mask applications using the SLM-based Sigma7300 DUV mask writer
Ostrom, T. ; Beyerl, A. ; Sjoberg, H. ; Newman, T. ; Hogfeldt, P.
Pub. info.: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.155-166,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5835
2.

Conference Proceedings
Conference Proceedings
2. FEP-171 resist thickness optimization and dry etch screening on NTAR7 chrome substrates for Sigma7300 DUV laser pattern generator
Karlsson, J. O. ; Xing, K. ; Bajramovic, A. ; Dahlberg, H. ; Bjornberg, C. ; Hogfeldt, P. ; Kjellberg, L. ; Fosshaug, H. ; Dahlberg, A. ; Lundvall, A.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.234-244,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
3.

Conference Proceedings
Conference Proceedings
3. High performance FEP-171 resist process in combination with NTAR7 and NTAR5 chrome and the Sigma7300 DUV mask writer [5853-04]
Xing, K. ; Karlsson, J. ; Paulson, A. ; Bjornberg, C. ; Lundvall, A. ; Hogfeldt, P. ; Vedenpaa, J. ; Goodoree, R. ; Bjuggren, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.31-41,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
4.

Conference Proceedings
Conference Proceedings
4. Pattern accuracy and throughput optimization for an SLM-based 248-nm DUV laser mask pattern generator
Sjoberg, H. ; Chauvet, J.-M. ; Harkesjo, J. ; Hogfeldt, P. ; Karawajczyk, A. ; Karlsson, J. ; Kjellberg, L. ; Mahlen, J. ; Beyerl, A. ; Vedenpaa, J. ; Goodoree, R. ; Bjuggren, M. ; Aman, J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.632-642,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
5.

Conference Proceedings
Conference Proceedings
5. Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes
Aman, J. ; Fosshaug, H.A. ; Hedqvist, T. ; Harkesjo, J. ; Hogfeldt, P. ; Jacobsson, M. ; Karawajczyk, A. ; Karlsson, J. ; Rosling, M. ; Sjoberg, H.J.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.684-694,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
6.

Conference Proceedings
Conference Proceedings
6. Influence of writing strategy on CD control for the spatial-light-modulator-based Sigma7300 DUV laser pattern generator
Fosshaug, H. ; Askebjer, P. ; Karlsson, J. ; Bajramovic, A. ; Xing, K. ; Eklund, R. ; Walford, J. ; Ekberg, M. ; Hogfeldt, P. ; ystrym, T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.879-894,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376