1.

Conference Proceedings
Conference Proceedings
1. THE DEPOSITION OF BOROPHOSPHOSILICATE GLASS FILMS BY LPCVD USING 2,4,6,8 TETRAMETHYLCYCLOTETRASILOXANE
O’Meara, David L. ; Hochberg, Arthur K.
Pub. info.: Chemical perspectives of microelectronic materials II : symposium held November 26-28, 1990, Boston, Massachusetts, U.S.A..  pp.533-538,  1991.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 204
2.

Conference Proceedings
Conference Proceedings
2. THE DEPOSITION OF SILICON OXIDE FILMS BY LPCVD AT TEMPERATURES AS LOW AS 100°C FROM A NEW LIQUID SOURCE
Hochberg, Arthur K. ; Roberts, David A.
Pub. info.: Chemical perspectives of microelectric materials III : symposium held November 30-December 3, 1992, Boston, Massachusetts, U.S.A..  pp.569-574,  1993.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 282
3.

Conference Proceedings
Conference Proceedings
3. THE LPCVD OF SILICON NITRIDE FILMS FROM ALKYLAZIDOSILANES
Roberts, David A. ; Hochberg, Arthur K. ; O’Meara, David L. ; Rusnak, Felicia ; Hockenhull, Herman
Pub. info.: Chemical perspectives of microelectronic materials II : symposium held November 26-28, 1990, Boston, Massachusetts, U.S.A..  pp.515-520,  1991.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 204
4.

Conference Proceedings
Conference Proceedings
4. SURFACE AND REACTOR EFFECTS ON SELECTIVE COPPER DEPOSITION FROM Cu(hfac)tmvs
Norman, John A.T. ; Roberts, David A. ; Hochberg, Arthur K.
Pub. info.: Chemical perspectives of microelectric materials III : symposium held November 30-December 3, 1992, Boston, Massachusetts, U.S.A..  pp.347-352,  1993.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 282
5.

Conference Proceedings
Conference Proceedings
5. The Chemical Vapor Deposition of Al-Cu Films Utilizing Independent Aluminum and Copper Organometallic Sources in a Simultaneous Deposition
Healy, Matthew D. ; Norman, John A. T. ; Hochberg, Arthur K.
Pub. info.: Advanced metallization for future ULSI : symposium held April 8-11, 1996, San Francisco, California, U.S.A..  pp.289-,  1996.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 427
6.

Conference Proceedings
Conference Proceedings
6. DIETHYLSILANE AS A SILICON SOURCE FOR THE DEPOSITION OF SILICON NITRIDE AND SILICON OXYNITRIDE FILMS BY LPCVD
Hochberg, Arthur K. ; O’Meara, David L.
Pub. info.: Chemical perspectives of microelectronic materials II : symposium held November 26-28, 1990, Boston, Massachusetts, U.S.A..  pp.509-514,  1991.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 204