1.

Conference Proceedings
Conference Proceedings
1. 44. Poly-Si gate CMOS with hafnium silicate gate dielectric
Hobbs, C. ; Grant, J. ; Kher, S. ; Dhandapani, V. ; Taylor, B. ; Dip, L. ; Hegde, R. ; Metzner, C. ; Tseng, H. ; Gilmer, D. ; Franke, A. ; Garcia, R. ; Ilebert, L. ; Azrak, M. ; Sing, D. ; Stephens, J.K ; Scrogum, C. ; Rai, R. ; Becnel, V ; Conner, I ; White, B. ; Tobin, P.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.361-366,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
2.

Conference Proceedings
Conference Proceedings
2. 43. Roadblocks and detours for poly-silicon / metal-oxide MOS integration
Gilmer, D.C. ; Hobbs, C. ; Grant, J. ; Hegde, R. ; Tseng, H. ; Triyoso, D. ; Roan, D. ; Cotton, R. ; Smith, J ; Dhandapani, V ; Garcia, R. ; Dip, L. ; Rai, R. ; Conner, J ; Samavedam, S. ; Taylor, B. ; Tobin, P.J.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.345-360,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
3.

Conference Proceedings
Conference Proceedings
3. Tantalum Pentoxide Gate Dielectrics Formed by Tantalum Oxidation
Hobbs, C. ; Hegde, R. ; Maiti, B. ; Nagabushnam, R. ; La, L. ; Reid, K. ; Dip, A. ; Grove, L. ; Conner, J. ; Kaushik, V. ; Prabhu, L. ; Anderson, A. ; Bagchi, S. ; Mendonca, J. ; Tobin, P.
Pub. info.: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.379-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 567
4.

Conference Proceedings
Conference Proceedings
4. Low-Temperature Remote-Plasma-Assisted Jet Vapor Deposition of Silicon Nitride
Veteran, J. ; Hobbs, C. ; Hegde, R. ; Tobin, P. ; Wang, V. ; Tseng, H. ; Kenig, G. ; Hartig, M. ; Tamagawa, T. ; Doran, R. ; Makowicz, P. ; Schmitt, J. ; Halpern, B. ; Zhang, J. Z.
Pub. info.: Chemical aspects of electronic ceramics processing : symposium held November 30-December 4, 1997, Boston, Massachusetts, U.S.A..  pp.445-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 495
5.

Conference Proceedings
Conference Proceedings
5. High density plasma etching of Ta2O5-selectivity to Si and effect of UV light enhancememt
Lee, K. P. ; Cho, H. ; Singh, R. K. ; Pearton, S. J. ; Hobbs, C. ; Tobin, P.
Pub. info.: Chemical processing of dielectrics, insulators and electronic ceramics : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A..  pp.257-,  2000.  Warrendale.  MRS-Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 606
6.

Conference Proceedings
Conference Proceedings
6. Atomic Vapor Deposition (AVDTM) process for High Performance HfO2 Dielectric Layers
Cosnier, V. ; Dabertrand, K. ; Blonkowski, S. ; Lhostis, S. ; Zoll, S. ; Morand, Y. ; Descombes, S. ; Guillaumot, B. ; Hobbs, C. ; Rochat, N. ; Rolland, G. ; Renault, O. ; Garros, X. ; Casse, M. ; Mitard, J. ; Lehnen, P. ; Miedl, S. ; Lindner, J. ; Schumacher, M.
Pub. info.: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.287-292,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 811
7.

Conference Proceedings
Conference Proceedings
7. Factors Influencing the Threshold Voltages of Metal Oxide CMOS Devices
Hobbs, C. ; Fonseca, L. ; Samavedam, S. ; Grant, J. ; Dhandapani, V. ; Taylor, B. ; Dip, L. ; Triyoso, D. ; Gilmer, D. ; Schaeffer, J. ; Hegde, R. ; Tseng, H ; White, B. ; Tobin, P.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.313-320,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01