1.

Conference Proceedings
Conference Proceedings
1. Mask blank particle inspection in vacuum environments
Sekine, A. ; Nagahama, H. ; Tojo, T. ; Akeno, K. ; Hirano, R.
Pub. info.: Optomechatronic systems III : 12-14 November 2002, Stuttgart, Germany.  pp.624-631,  2002.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4902
2.

Conference Proceedings
Conference Proceedings
2. Development of next-generation mask inspection method by using the feature of mask image captured with 199-nm inspection optics [6349-138]
Tsuji, Y. ; Kikuiri, N. ; Murakami, S. ; Takahara, K. ; Isomura, I. ; Tamura, Y. ; Yamashita, K. ; Hirano, R. ; Tateno, M. ; Matsumura, K. ; Takayama, N. ; Usuda, K.
Pub. info.: Photomask Technology 2006.  pp.63493M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
3.

Conference Proceedings
Conference Proceedings
3. Advanced electron-beam writing system EX-11 for next-generation mask fabrication
Tojo, T. ; Yoshikawa, R. ; Ogawa, Y. ; Tamamushi, S. ; Hattori, Y. ; Koikari, S. ; Kusakabe, H. ; Abe, T. ; Ogasawara, M. ; Akeno, K. ; Anze, H. ; Hattori, K. ; Hirano, R. ; Yoshitake, S. ; Iijima, T. ; Ohtoshi, K. ; Matsuki, K. ; Shimomura, N. ; Yamada, N. ; Higurashi, H. ; Nakayamada, N. ; Fukudome, Y. ; Hara, S. ; Murakami, E. ; Kamikubo, T. ; Suzuki, Y. ; Oogi, S. ; Shimizu, M. ; Nishimura, S. ; Tsurumaki, H. ; Yasuda, S. ; Ooki, K. ; Koyama, K. ; Watanabe, S. ; Yano, M. ; Suzuki, H. ; Hoshino, H. ; Toriumi, M. ; Watanabe, O. ; Tsuji, K. ; Katayama, M. ; Tsuchiya, S. ; Suzuki, K. ; Kurasawa, S. ; Okuzono, K. ; Yamada, H. ; Handa, K. ; Suzuki, Y. ; Akiyama, T. ; Tada, Y. ; Noma, A. ; Takigawa, T.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.416-425,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
4.

Conference Proceedings
Conference Proceedings
4. New mask blank handling system for the advanced electron-beam writer EX-11
Yoshitake, S. ; Ooki, K. ; Ogawa, Y. ; Ogura, K. ; Yamamoto, T. ; Hirano, R. ; Toriumi, M. ; Tojo, T.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.436-445,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
5.

Conference Proceedings
Conference Proceedings
5. Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond (Invited Paper) [6283-130]
Kikuiri, N. ; Murakami, S. ; Tsuchiya, H. ; Tateno, M. ; Takahara, K. ; Imai, S. ; Hirano, R. ; Isomura, I. ; Tsuji, Y. ; Tamura, Y. ; Matsumura, K. ; Usuda, K. ; Otaki, M. ; Suga, O. ; Ohira, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830Y-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
6.

Conference Proceedings
Conference Proceedings
6. Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance
Tojo, T. ; Hirano, R. ; Tsuchiya, H. ; Oaki, J. ; Nishizaka, T. ; Sanada, Y. ; Matsuki, K. ; Isomura, I. ; Ogawa, R. ; Kobayashi, N. ; Nakashima, K. ; Sugihara, S. ; Inoue, H. ; Imai, S. ; Suzuki, H. ; Sekine, A. ; Taya, M. ; Miwa, A. ; Yoshioka, N. ; Ohira, K. ; Chung, D. -H. ; Otaki, M.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1011-1023,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567