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10 results

Conference Proceedings

1. High-NA lithographic imagery at Brewster's angle

Brunner, T.A. ; Seong, N. ; Hinsberg, W.D. ; Hoffnagle, J.A. ; Houle, F.A. ; Sanchez, M.I.

Pub. info.:	Optical Microlithography XV. Part One pp.1-10, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

2. Carbon nanotube scanning probe for surface profiling of DUV and 193-nm photoresist pattern

Nguyen, C.V. ; Stevens, R.M.D. ; Barber, J. ; Han, J. ; Meyyappan, M. ; Sanchez, M.I. ; Larson, C.E. ; Hinsberg, W.D.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVI. Part One pp.58-62, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4689

Conference Proceedings

3. High numerical aperture: imaging implications for chemically amplified photoresists

Sanchez, M.I. ; Houle, F.A. ; Hoffnagle, J.A. ; Brunner, T.A. ; Hinsberg, W.D.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.351-356, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

4. Characterization of the polymer-developer interface in 193-nm photoresist polymers and formulations during dissolution

Wallow, T.I. ; Chan, W. ; Hinsberg, W.D. ; Lee, S.-W.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.299-312, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

5. Effect of humidity on deprotection kinetics in chemically amplified resists

Burns, S.D. ; Medeiros, D.R. ; Johnson, H.F. ; Wallraff, G.M. ; Hinsberg, W.D. ; Willson, C.G.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.321-331, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

6. Characterization of photoresist spatial resolution by interferometric lithography

Hoffnagle, J.A. ; Hinsberg, W.D. ; Houle, F.A. ; Sanchez, M.I.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVII. 1 pp.464-472, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5038

Conference Proceedings

7. EUV photoresist performance results from the VNL and the EUV LLC

Cobb, J.L. ; Dentinger, P.M. ; Hunter, L.L. ; O'Connell, D.J. ; Gallatin, G.M. ; Hinsberg, W.D. ; Houle, F.A. ; Sanchez, M.I. ; Domke, W.-D. ; Wurm, S. ; Okoroanyanwu, U. ; Lee, S.H.

Pub. info.:	Emerging Lithographic Technologies VI. Part One pp.412-420, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4688

Conference Proceedings

8. Using the critical ionization model for resist development to estimate contrast curves and roughening

Houle, F.A. ; Hinsberg, W.D. ; Sanchez, M.I.

Pub. info.:	Advances in Resist Technology and Processing XX. 1 pp.334-342, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039

Conference Proceedings

9. Extendibility of chemically amplified resists: another brick wall? (Invited Paper)

Hinsberg, W.D. ; Houle, F.A. ; Sanchez, M.I. ; Hoffnagle, J.A. ; Wallraff, G.M. ; Medeiros, D.R. ; Gallatin, G.M. ; Cobb, J.L.

Pub. info.:	Advances in Resist Technology and Processing XX. 1 pp.1-14, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039

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Conference Proceedings

10. Hydrogen bonding and aqueous base dissolution behavior of hexafluoroisopropanol-bearing polymers

Ito, H. ; Hinsberg, W.D. ; Rhodes, L.F. ; Chang, C.

Pub. info.:	Advances in Resist Technology and Processing XX. 1 pp.70-79, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039

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