1.

Conference Proceedings
Conference Proceedings
1. Toughened, Inorganic-Organic Hybrid Materials for Microelectronic Application
Hedrick, J. L. ; Srinivasan, S. ; Cha, H-J. ; Yoon, D. ; Flores, V. ; Harbison, M. ; Pietro, R. Di ; Hinsberg, W. ; Deline, V. ; Brown, H. R. ; Sherwood, M. ; Paulson, E. ; Miller, R. D. ; Cook, R. ; Liniger, E. ; Simonyi, E. ; Klaus, D. ; Cohen, S. ; Hummel, J.
Pub. info.: Low-dielectric constant materials II : symposium held December 2-3, 1996, Boston, Massachusetts, U.S.A..  pp.47-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 443
2.

Conference Proceedings
Conference Proceedings
2. Mechanistic studies of chemically amplified resists
Hinsberg, W. ; Wallraff, G. ; Houle, F. ; Morrison, M. ; Frommer, J. ; Beyers, R. ; Hutchinson, J.
Pub. info.: Organic thin films : structure and applications.  pp.344-359,  1998.  Washington, DC.  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 695
3.

Conference Proceedings
Conference Proceedings
3. Liquid immersion lithography: evaluation of resist issues
Hinsberg, W. ; Wallraff, G.M. ; Larson, C.E. ; Davis, B.W. ; Deline, V. ; Raoux, S. ; Miller, D. ; Houle, F.A. ; Hoffnagle, J. ; Sanchez, M.I. ; Rettner, C. ; Sundberg, L.K. ; Medeiros, D.R. ; Dammel, R.R. ; Conley, W.E.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.21-33,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
4.

Conference Proceedings
Conference Proceedings
4. Deep-UV immersion interferometric lithography
Raub, A.K. ; Frauenglass, A. ; Brueck, S.R.J. ; Conley, W. ; Dammel, R.R. ; Romano, A. ; Sato, M. ; Hinsberg, W.
Pub. info.: Optical Microlithography XVII.  pp.306-318,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
5.

Conference Proceedings
Conference Proceedings
5. Fast calculation of images for high numerical aperture lithography
Rosenbluth, A.E. ; Gallatin, G.M. ; Gordon, R.L. ; Hinsberg, W. ; Hoffnagle, J. ; Houle, F. ; Lai, K. ; Lvov, A. ; Sanchez, M. ; Seong, N.
Pub. info.: Optical Microlithography XVII.  pp.615-628,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
6.

Conference Proceedings
Conference Proceedings
6. Reactive dissolution kinetics of lithographic copolymers
Hinsberg, W. ; Houle, F.A. ; Ito, H.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.352-359,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376