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Laser and particle-beam chemical processing for microelectronics : symposium held December 1-3, 1987, Boston, Massachusetts, USA. pp.3-12, 1988. Pittsburgh, Pa.. Materials Research Society
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Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1320-1328, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Iriki, N. ; Miyazaki, N. ; Homma, M. ; Sato, T. ; Onodera, T. ; Matsuda, T. ; Uga, T. ; Higashino, H. ; Higashikawa, I. ; Yoshioka, N.
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20th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.60-69, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Yasui, T. ; Higashikawa, I. ; Kuschnerus, P. ; Engel, T. ; Zibold, A.M. ; Hertfelder, C. ; Kobiyama, Y. ; Urbach, J.-P. ; Schilz, C.M. ; Semmler, A.
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Photomask and Next-Generation Lithography Mask Technology X. pp.533-544, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Shigematsu, S. ; Nakano, T. ; Shigemoto, H. ; Kondo, M. ; Nakagawa, H. ; Sasaki, H. ; Higashikawa, I.
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Photomask and Next-Generation Lithography Mask Technology X. pp.606-616, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Kuschnerus, P. ; Engel, T. ; Zibold, A.M. ; Hertfelder, C. ; Yasui, T. ; Higashikawa, I. ; Schilz, C.M. ; Semmler, A.
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Photomask and Next-Generation Lithography Mask Technology X. pp.400-406, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Miyazaki, N. ; Iriki, N. ; Homma, M. ; Sato, T. ; Mori, M. ; Imoriya, T. ; Onodera, T. ; Matsuda, T. ; Higashino, H. ; Okuda, K. ; Higashikawa, I. ; Yoshioka, N.
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Optical Microlithography XVI. Part Two pp.1079-1090, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Yasui, T. ; Higashikawa, I. ; Kuschnerus, P. ; Degel, W. ; Boehm, K. ; Zibold, A.M. ; Kobiyama, Y. ; Urbach, J.-P. ; Schilz, C.M. ; Teuber Semmler, S.
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Photomask and Next-Generation Lithography Mask Technology XI. pp.743-750, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering